๐Ÿ’ป Microchannel Two-Phase Flow Boiling

Model high-heat-flux two-phase flow boiling in microchannels: two-phase HTC (htp), confinement number (Co), boiling number (Bo), chip wall temperature, and pressure drop.

โšก Fortran 90 Engine Double Precision (IEEE 754) โœ“ ISO / ASME Validated
Microchannel Two-Phase Flow Boiling Convection
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๐Ÿ‘๏ธ Views 36
โšก Solves 29
๐Ÿ’พ Downloads 387 ๐Ÿ“ฆ Fortran Code 10.8 KB
๐Ÿ“… Released Jun 2026
โฑ๏ธ Latency < 1 ms
โšก TOOLS & REPORTS:
๐Ÿ’พ Download Fortran 90
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๐Ÿ’ป Silicon Microchannel Cold Plate & Confined Vapor Slugs

Real-time visual simulation: High-heat-flux microchannel array with Taylor vapor slugs sweeping through micro-fins

๐Ÿ“ Configuration & Presets

๐Ÿ–ฅ๏ธ AI GPU Chip (R1233zd) โšก EV SiC Inverter (Water) ๐Ÿ“ก Radar GaN RF Power โ„๏ธ Micro-Evaporator Loop
๐Ÿ“ Microchannel Array Dimensions
โšก Operating Hydraulics & Heat Flux
1 W/cmยฒ = 10 kW/mยฒ
๐Ÿงช Fluid Thermophysical Properties
Kandlikar Microchannel Formulation:
โ€ข Confinement Number: Co = (1/Dh) โˆš(ฯƒ / (g (ฯL โˆ’ ฯV))) > 0.5
โ€ข Boiling Number: Bo = qโ€ณ / (G ยท hfg)
โ€ข Two-Phase HTC: htp = max( hNBD, hCBD ) [W/(mยฒยทK)]
โ€ข Wall Temperature: Twall = Tsat + (qโ€ณ / htp) [ยฐC]

๐Ÿ“Š Microchannel Boiling Results

๐Ÿ“Š Output Summary
๐Ÿ’พ Fortran Source

Two-Phase Boiling HTC (htp)
htp = 112,266 W/(mยฒยทK)
Base Wall Temp: 50.1 ยฐC (Tsat = 32.3 ยฐC) | Heat: 1280.0 W
Co = 4.16 (Microchannel)
Hydraulic Diameter (Dh) 0.600 mm Microchannel regime
Boiling Number (Bo) 7.49e-4 qโ€ณ / (G ยท hfg)
Two-Phase Pressure Drop 89.23 kPa 0.892 bar
Liquid-Only HTC (hLO) 17,353 W/(mยฒยทK) Boiling enhancement = 6.5x

๐Ÿ“ˆ Boiling HTC h_tp [W/(mยฒยทK)] vs Vapor Quality x

๐Ÿ“‰ Two-Phase Pressure Drop ฮ”P (kPa) vs Mass Flux G

=================================================================
 THERMOFLUIDCALC โ€” MICROCHANNEL FLOW BOILING (KANDLIKAR) REPORT
=================================================================
Case Title                 : EV Silicon Carbide (SiC) Inverter Power Module Water Boiling
Microchannel Array         : w = 0.40 mm, h = 1.20 mm, L = 40.0 mm (Dh = 0.600 mm, N = 40)
Operating Flow Conditions  : Mass Flux G = 1200.0 kg/(m2.s), Base Heat Flux q" = 200.0 W/cm2 (2000.0 kW/m2)
Thermodynamic State        : Vapor Quality x = 0.15, Saturation Pressure = 1.50 bar (Tsat = 32.3 C)
-----------------------------------------------------------------
CONFINEMENT NUMBER (Co)    : 4.161 [Confined Microchannel Flow]
BOILING NUMBER (Bo)        : 7.491e-4
TWO-PHASE BOILING HTC (htp): 112,265.9 W/(m2.K)
Liquid-Only Baseline HTC   : 17,353.4 W/(m2.K)
BASE WALL CHIP TEMPERATURE : 50.08 deg C (Overheat DeltaT = 17.81 C)
Two-Phase Pressure Drop    : 89.23 kPa (0.8923 bar)
Total Dissipated Heat Power: 1280.00 W
=================================================================

๐Ÿ“˜ Calculation Methodology & Microchannel Boiling Standards

Kandlikar Microchannel Correlation

Incorporates confinement effects ($Co$) and boiling number ($Bo$) to capture transition between nucleate bubble nucleation and thin-film evaporation:

htp = max( hNBD, hCBD )

Confinement Number Criterion

When $Co = \frac{1}{D_h}\sqrt{\frac{\sigma}{g(\rho_L - \rho_V)}} > 0.5$, bubble growth is constrained by channel walls, forming elongated Taylor slugs.

Key Engineering Assumptions

  • Parallel rectangular microchannel heat sinks with uniform flow distribution.
  • Saturated two-phase flow boiling regimes ($0.05 \le x \le 0.85$).
  • Applicable to semiconductor electronics, high-power lasers, and compact heat exchangers.